Exploiting Material Properties to Select a Suitable Wavelet Basis for Efficient Rendering

Jeroen Put, Nick Michiels, Philippe Bekaert

2014

Abstract

Nearly-orthogonal spherical wavelet bases can be used to perform rendering at higher quality and with significantly less coefficients for certain spherical functions, e.g. BRDF data. This basis avoids parameterisation artifacts from previous 2D methods, while at the same time retaining high-frequency details in the lighting. This paper demonstrates the efficiency of this representation for rendering purposes. Regular 2D Haar wavelets can still occasionally perform better, however. This is due to their property of being fully orthogonal. An important novelty of this paper lies in the introduction of a technique to select an appropriate wavelet basis on-the-fly, by utilising prior knowledge of materials in the scene. To show the influence of different bases on rendering quality, we perform a comparison of their parameterisation error and the compression performance.

Paper Citation

in Harvard Style

Put J., Michiels N. and Bekaert P. (2014). Exploiting Material Properties to Select a Suitable Wavelet Basis for Efficient Rendering . In Proceedings of the 9th International Conference on Computer Graphics Theory and Applications - Volume 1: GRAPP, (VISIGRAPP 2014) ISBN 978-989-758-002-4, pages 218-224. DOI: 10.5220/0004717202180224

in Bibtex Style

@conference{grapp14,
author={Jeroen Put and Nick Michiels and Philippe Bekaert},
title={Exploiting Material Properties to Select a Suitable Wavelet Basis for Efficient Rendering},
booktitle={Proceedings of the 9th International Conference on Computer Graphics Theory and Applications - Volume 1: GRAPP, (VISIGRAPP 2014)},
year={2014},
pages={218-224},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0004717202180224},
isbn={978-989-758-002-4},
}

in EndNote Style

TY - CONF
JO - Proceedings of the 9th International Conference on Computer Graphics Theory and Applications - Volume 1: GRAPP, (VISIGRAPP 2014)
TI - Exploiting Material Properties to Select a Suitable Wavelet Basis for Efficient Rendering
SN - 978-989-758-002-4
AU - Put J.
AU - Michiels N.
AU - Bekaert P.
PY - 2014
SP - 218
EP - 224
DO - 10.5220/0004717202180224